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Fabrication of Germanium-on-insulator in a Ge wafer with a crystalline Ge top layer and buried GeO2 layer by oxygen ion implantation |
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Titel: |
Fabrication of Germanium-on-insulator in a Ge wafer with a crystalline Ge top layer and buried GeO2 layer by oxygen ion implantation |
Auteur: |
Kumar Aggarwal, Vishal Ghatak, Ankita Kanjilal, Dinakar Kabiraj, Debdulal Singha, Achintya Bysakh, Sandip Kumar Medda, Samar Chakraborty, Supriya Raychaudhuri, A.K. |
Verschenen in: |
Materials science and engineering. B, Solid-state materials for advanced technology |
Paginering: |
Jaargang 260 () nr. C pagina's p. |
Jaar: |
2020 |
Inhoud: |
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Uitgever: |
Elsevier B.V. |
Bronbestand: |
Elektronische Wetenschappelijke Tijdschriften |
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