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Journal description
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Details for article 17 of 35 found articles
| Title: |
Low voltage stress-induced leakage current in HfO2 dielectric films |
| Author: |
Tan, Tingting Liu, Zhengtang Tian, Hao Liu, Wenting |
| Appeared in: |
Materials science and engineering. B, Solid-state materials for advanced technology |
| Paging: | Volume 171 (2010) nr. 1-3 pages 3 p. |
| Year: |
2010 |
| Contents: | |
| Publisher: |
Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 17 of 35 found articles
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