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Journal description
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Details for article 7 of 11 found articles
| Title: |
Plasma enhanced deposition of a-Si-H: comparison of two reactor arrangements |
| Author: |
Layeillon, L. Dollet, A. Despax, B. |
| Appeared in: |
Chemical engineering journal and the biochemical engineering journal |
| Paging: | Volume 58 (1995) nr. 1 pages 5 p. |
| Year: |
1995 |
| Contents: | |
| Publisher: |
Published by Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 7 of 11 found articles
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