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                                       Details for article 67 of 193 found articles
 
 
  Environment-friendly chemical mechanical polishing for copper with atomic surface confirmed by transmission electron microscopy
 
 
Title: Environment-friendly chemical mechanical polishing for copper with atomic surface confirmed by transmission electron microscopy
Author: Liu, Dongdong
Zhang, Zhenyu
Feng, Jiajian
Yu, Zhibin
Meng, Fanning
Shi, Chunjing
Xu, Guanghong
Shi, Shuyan
Liu, Wei
Appeared in: Colloids and surfaces. A, Physicochemical and engineering aspects
Paging: Volume 656 () nr. PB pages p.
Year: 2023
Contents:
Publisher: Elsevier B.V.
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 67 of 193 found articles
 
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 Koninklijke Bibliotheek - National Library of the Netherlands