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Journal description
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Details for article 995 of 6391 found articles
| Title: |
Chemical evidences for the optimal coagulant dosage and pH adjustment of silica removal from chemical mechanical polishing (CMP) wastewater |
| Author: |
Kuan, Wen-Hui Hu, Ching-Yao |
| Appeared in: |
Colloids and surfaces. A, Physicochemical and engineering aspects |
| Paging: | Volume 342 (2009) nr. 1-3 pages 7 p. |
| Year: |
2009 |
| Contents: | |
| Publisher: |
Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 995 of 6391 found articles
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