Comparison of direct-total-reflection X-ray fluorescence, sweeping-total-reflection X-ray fluorescence and vapor phase decomposition-total-reflection X-ray fluorescence applied to the characterization of metallic contamination on semiconductor wafers
Titel:
Comparison of direct-total-reflection X-ray fluorescence, sweeping-total-reflection X-ray fluorescence and vapor phase decomposition-total-reflection X-ray fluorescence applied to the characterization of metallic contamination on semiconductor wafers
Auteur:
Danel, Adrien Cabuil, Nicolas Lardin, Thierry Despois, Dominique Veillerot, Marc Geoffroy, Charles Yamagami, Motoyuki Kohno, Hiroshi