Analysis of Ni on Si-wafer surfaces using synchrotron radiation excited total reflection X-ray fluorescence analysis 1 This paper was presented at the 6th Conference on “Total Reflection X-Ray Fluorescence Analysis and Related Methods” (TXRF '96) held in two parts in Eindhoven (The Netherlands) and Dortmund (Germany) in June 1996, and is published in the Special Issue of Spectrochimica Acta, Part B, dedicated to that Conference. 1
Title:
Analysis of Ni on Si-wafer surfaces using synchrotron radiation excited total reflection X-ray fluorescence analysis 1 This paper was presented at the 6th Conference on “Total Reflection X-Ray Fluorescence Analysis and Related Methods” (TXRF '96) held in two parts in Eindhoven (The Netherlands) and Dortmund (Germany) in June 1996, and is published in the Special Issue of Spectrochimica Acta, Part B, dedicated to that Conference. 1
Author:
Wobrauschek, P. Görgl, R. Kregsamer, P. Streli, Ch. Pahlke, S. Fabry, L. Haller, M. Knöchel, A. Radtke, M.