|
| << previous | next >> |
Journal description
All volumes of the corresponding journal
All issues of the corresponding volume
All articles of the corresponding issues
Details for article 3835 of 4350 found articles
| Title: |
The effects of TMDD-PA concentration on roughness of Si 〈1 1 0〉 and etching rate ratio of Si 〈1 1 0〉/〈1 1 1〉 in alkaline KOH solution |
| Author: |
Zhu, Chunlin Jiao, Qingbin Tan, Xin Hu, Hao Bayanheshig, |
| Appeared in: |
Chemical physics |
| Paging: | Volume 529 () nr. C pages p. |
| Year: |
2020 |
| Contents: | |
| Publisher: |
Published by Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 3835 of 4350 found articles
| << previous | next >> |