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Recent progress in photoemission microscopy with emphasis on chemical and magnetic sensitivity |
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Title: |
Recent progress in photoemission microscopy with emphasis on chemical and magnetic sensitivity |
Author: |
Swiech, W Fecher, G.H Ziethen, Ch Schmidt, O Schönhense, G Grzelakowski, K M. Schneider, C Frömter, R Oepen, H.P Kirschner, J |
Appeared in: |
Journal of electron spectroscopy and related phenomena |
Paging: |
Volume 84 (1997) nr. 1-3 pages 18 p. |
Year: |
1997 |
Contents: |
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Publisher: |
Elsevier Science B.V. |
Source file: |
Elektronische Wetenschappelijke Tijdschriften |
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