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Electron beam writing and direct processing system for nanolithography |
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Titel: |
Electron beam writing and direct processing system for nanolithography |
Auteur: |
Hiroshima, H. Okayama, S. Ogura, M. Komuro, M. Nakazawa, H. Nakagawa, Y. Ohi, K. Tanaka, K. |
Verschenen in: |
Nuclear instruments and methods in physics research. Section A, Accelerators, spectrometers, detectors and associated equipment |
Paginering: |
Jaargang 363 (1995) nr. 1-2 pagina's 6 p. |
Jaar: |
1995 |
Inhoud: |
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Uitgever: |
Published by Elsevier B.V. |
Bronbestand: |
Elektronische Wetenschappelijke Tijdschriften |
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