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The influence of thermal processing on structural and electrical properties of W x Si1−x /Si multilayers |
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Titel: |
The influence of thermal processing on structural and electrical properties of W x Si1−x /Si multilayers |
Auteur: |
Vávra, I. Lobotka, P. Machajdík, D. Pochaba, I. Wallenberg, L.R. Senderák, R. Jergel, M. Holý, V. Kubena, J. |
Verschenen in: |
Nuclear instruments and methods in physics research. Section A, Accelerators, spectrometers, detectors and associated equipment |
Paginering: |
Jaargang 350 (1994) nr. 1-2 pagina's 12 p. |
Jaar: |
1994 |
Inhoud: |
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Uitgever: |
Published by Elsevier B.V. |
Bronbestand: |
Elektronische Wetenschappelijke Tijdschriften |
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