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Regrowth behaviour of Si1−x Ge x/Si structures formed by Ge+ ion implantation and post amorphisation |
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Titel: |
Regrowth behaviour of Si1−x Ge x/Si structures formed by Ge+ ion implantation and post amorphisation |
Auteur: |
Zhang, J.P. Wilson, R.J. Hemment, P.L.F. Claverie, A. Cristiano, F. Salles, P. Wen, J.Q. Evans, J.H. Peaker, A.R. Parker, G.J. |
Verschenen in: |
Nuclear instruments and methods in physics research. Section B, Beam interactions with materials and atoms |
Paginering: |
Jaargang 84 (1994) nr. 2 pagina's 7 p. |
Jaar: |
1994 |
Inhoud: |
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Uitgever: |
Published by Elsevier B.V. |
Bronbestand: |
Elektronische Wetenschappelijke Tijdschriften |
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