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Journal description
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Details for article 12 of 21 found articles
| Title: |
Range parameters and annealing behaviour of 250–1500 keV high energy boron and phosphorus implantations into silicon |
| Author: |
Ellmer, K. Mertens, A. Rockoff, A. Röhrich, J. Vysek, W.-M. |
| Appeared in: |
Nuclear instruments and methods in physics research. Section B, Beam interactions with materials and atoms |
| Paging: | Volume 62 (1992) nr. 4 pages 7 p. |
| Year: |
1992 |
| Contents: | |
| Publisher: |
Published by Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 12 of 21 found articles
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