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Journal description
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Details for article 32 of 74 found articles
| Title: |
High energy ion implantation for C-MOS isolation n-wells technology: Problems related to the use of multicharged phosphorous ions in an industrial context |
| Author: |
Spinelli, P. Escaron, J. Soubie, A. Bruel, M. |
| Appeared in: |
Nuclear instruments and methods in physics research. Section B, Beam interactions with materials and atoms |
| Paging: | Volume 6 (1985) nr. 1-2 pages 4 p. |
| Year: |
1985 |
| Contents: | |
| Publisher: |
Published by Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 32 of 74 found articles
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