In Plasma ion beam analysis of polymer layer and adsorbed H monolayer etching
Titel:
In Plasma ion beam analysis of polymer layer and adsorbed H monolayer etching
Auteur:
Fortier, Louis-Charles Chicoine, Martin Chouteau, Simon Clausse, Mathilde Lalande, Émile Lussier, Alexandre W. Roorda, Sjoerd Stafford, Luc Terwagne, Guy Schiettekatte, François
Verschenen in:
Nuclear instruments and methods in physics research. Section B, Beam interactions with materials and atoms