|
| << previous | next >> |
Journal description
All volumes of the corresponding journal
All issues of the corresponding volume
All articles of the corresponding issues
Details for article 16 of 17 found articles
| Title: |
Strain and orientation in epitaxial CoSi2(111) layers formed by ion implantation |
| Author: |
Wu, M.F. Vantomme, A. Langouche, G. Vanderstraeten, H. Bruynseraede, Y. |
| Appeared in: |
Nuclear instruments and methods in physics research. Section B, Beam interactions with materials and atoms |
| Paging: | Volume 54 (1991) nr. 4 pages 9 p. |
| Year: |
1991 |
| Contents: | |
| Publisher: |
Published by Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 16 of 17 found articles
| << previous | next >> |