Geant4 physics processes for microdosimetry and secondary electron emission simulation: Extension of MicroElec to very low energies and 11 materials (C, Al, Si, Ti, Ni, Cu, Ge, Ag, W, Kapton and SiO2)
Titel:
Geant4 physics processes for microdosimetry and secondary electron emission simulation: Extension of MicroElec to very low energies and 11 materials (C, Al, Si, Ti, Ni, Cu, Ge, Ag, W, Kapton and SiO2)
Auteur:
Gibaru, Q. Inguimbert, C. Caron, P. Raine, M. Lambert, D. Puech, J.
Verschenen in:
Nuclear instruments and methods in physics research. Section B, Beam interactions with materials and atoms