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                                       Details for article 57 of 92 found articles
 
 
  Oxygen depth profiling study of copper oxide films on silicon (100) substrates by 16O(α,α)16O resonance
 
 
Title: Oxygen depth profiling study of copper oxide films on silicon (100) substrates by 16O(α,α)16O resonance
Author: Jian, Li
Matienzo, L.J.
Revesz, P.
Vizkelethy, Gy.
Wang, S.Q.
Kaufman, J.J.
Mayer, J.W.
Appeared in: Nuclear instruments and methods in physics research. Section B, Beam interactions with materials and atoms
Paging: Volume 46 (1990) nr. 1-4 pages 4 p.
Year: 1990
Contents:
Publisher: Published by Elsevier B.V.
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 57 of 92 found articles
 
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 Koninklijke Bibliotheek - National Library of the Netherlands