|
| << previous | next >> |
Journal description
All volumes of the corresponding journal
All issues of the corresponding volume
All articles of the corresponding issues
Details for article 7 of 31 found articles
| Title: |
Charge trapping effect in HfO2-based high-k gate dielectric stacks after heavy ion irradiation: The role of oxygen vacancy |
| Author: |
Li, Zongzhen Liu, Tianqi Bi, Jinshun Yao, Huijun Zhang, Zhenxing Zhang, Shengxia Liu, Jiande Zhai, Pengfei Liu, Jie |
| Appeared in: |
Nuclear instruments and methods in physics research. Section B, Beam interactions with materials and atoms |
| Paging: | Volume 459 () nr. C pages 143-147 |
| Year: |
2019 |
| Contents: | |
| Publisher: |
Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 7 of 31 found articles
| << previous | next >> |