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                                       Details for article 60 of 81 found articles
 
 
  Reduction in contact resistance and structural evaluation of Al/Ti electrodes on Si-implanted GaN
 
 
Title: Reduction in contact resistance and structural evaluation of Al/Ti electrodes on Si-implanted GaN
Author: Nishimura, Tomoaki.
Kasai, Takeshi
Mishima, Tomonori
Kuriyama, Kazuo
Nakamura, Tohru
Appeared in: Nuclear instruments and methods in physics research. Section B, Beam interactions with materials and atoms
Paging: Volume 450 () nr. C pages 244-247
Year: 2019
Contents:
Publisher: Elsevier B.V.
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 60 of 81 found articles
 
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 Koninklijke Bibliotheek - National Library of the Netherlands