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                                       Details for article 11 of 21 found articles
 
 
  Ion implanted GaN MISFETs fabricated in Mg implanted layers activated by conventional rapid thermal annealing
 
 
Title: Ion implanted GaN MISFETs fabricated in Mg implanted layers activated by conventional rapid thermal annealing
Author: Yoshino, Michitaka
Sugamata, Kota
Ikeda, Kiyoji
Nishimura, Tomoaki
Kuriyama, Kazuo
Nakamura, Tohru
Appeared in: Nuclear instruments and methods in physics research. Section B, Beam interactions with materials and atoms
Paging: Volume 449 (2019) nr. C pages 49-53
Year: 2019
Contents:
Publisher: Elsevier B.V.
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 11 of 21 found articles
 
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 Koninklijke Bibliotheek - National Library of the Netherlands