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Journal description
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Details for article 23 of 25 found articles
| Title: |
Shallow junction formation with boron fluoride and low energy boron ion implantation into silicon |
| Author: |
Lu, Zhiheng Zhang, Chaoming Li, Sujie Luo, Yan Zhang, Huixing |
| Appeared in: |
Nuclear instruments and methods in physics research. Section B, Beam interactions with materials and atoms |
| Paging: | Volume 43 (1989) nr. 1 pages 4 p. |
| Year: |
1989 |
| Contents: | |
| Publisher: |
Published by Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 23 of 25 found articles
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