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Journal description
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Details for article 7 of 24 found articles
| Title: |
Depth profiles of implanted 18F, 79Br, and 132Xe in silicon in the energy range 85–600 keV |
| Author: |
Tan, Chunyu Xia, Yueyuan Yang, Hong Sun, Xiufang Liu, Jiarui Zheng, Zongshuang Zhu, Peiran |
| Appeared in: |
Nuclear instruments and methods in physics research. Section B, Beam interactions with materials and atoms |
| Paging: | Volume 42 (1989) nr. 1 pages 6 p. |
| Year: |
1989 |
| Contents: | |
| Publisher: |
Published by Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 7 of 24 found articles
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