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A method for analysis and profiling of boron, carbon and oxygen impurities in semiconductor wafers by recoil atoms in heavy ion beams |
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Titel: |
A method for analysis and profiling of boron, carbon and oxygen impurities in semiconductor wafers by recoil atoms in heavy ion beams |
Auteur: |
Petrascu, M. Berceanu, I. Brancus, I. Buta, A. Duma, M. Grama, C. Lazar, I. Mihai, I. Petrovici, M. Simion, V. Mihaila, M. Ghita, I. |
Verschenen in: |
Nuclear instruments and methods in physics research. Section B, Beam interactions with materials and atoms |
Paginering: |
Jaargang 4 (1984) nr. 3 pagina's 3 p. |
Jaar: |
1984 |
Inhoud: |
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Uitgever: |
Published by Elsevier B.V. |
Bronbestand: |
Elektronische Wetenschappelijke Tijdschriften |
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