Study of damage formation and annealing of implanted III-nitride semiconductors for optoelectronic devices
Title:
Study of damage formation and annealing of implanted III-nitride semiconductors for optoelectronic devices
Author:
Faye, D. Nd. Fialho, M. Magalhães, S. Alves, E. Ben Sedrine, N. Rodrigues, J. Correia, M.R. Monteiro, T. Boćkowski, M. Hoffmann, V. Weyers, M. Lorenz, K.
Appeared in:
Nuclear instruments and methods in physics research. Section B, Beam interactions with materials and atoms