MeV ion beam lithography of biocompatible halogenated Parylenes using aperture masks
Titel:
MeV ion beam lithography of biocompatible halogenated Parylenes using aperture masks
Auteur:
Whitlow, Harry J. Norarat, Rattanaporn Roccio, Marta Jeanneret, Patrick Guibert, Edouard Bergamin, Maxime Fiorucci, Gianni Homsy, Alexandra Laux, Edith Keppner, Herbert Senn, Pascal
Verschenen in:
Nuclear instruments and methods in physics research. Section B, Beam interactions with materials and atoms