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Ion beam studies of Hafnium based alternate high-k dielectric films deposited on silicon |
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Titel: |
Ion beam studies of Hafnium based alternate high-k dielectric films deposited on silicon |
Auteur: |
Manikanthababu, N. Chan, T.K. Pathak, A.P. Devaraju, G. Srinivasa Rao, N. Yang, P. Breese, M.B.H. Osipowicz, T. Nageswara Rao, S.V.S. |
Verschenen in: |
Nuclear instruments and methods in physics research. Section B, Beam interactions with materials and atoms |
Paginering: |
Jaargang 332 (2014) nr. C pagina's 4 p. |
Jaar: |
2014 |
Inhoud: |
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Uitgever: |
Elsevier B.V. |
Bronbestand: |
Elektronische Wetenschappelijke Tijdschriften |
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