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Modeling of ion beam induced damage in Si during channeling Rutherford backscattering spectrometry analysis |
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Titel: |
Modeling of ion beam induced damage in Si during channeling Rutherford backscattering spectrometry analysis |
Auteur: |
Hua, Wei Yao, Shu-De Wijesundera, Dharshana Wang, Xue-Mei Chu, Wei-Kan Martin, Michael Carter, Jesse Hollander, Mark Shao, Lin |
Verschenen in: |
Nuclear instruments and methods in physics research. Section B, Beam interactions with materials and atoms |
Paginering: |
Jaargang 267 (2009) nr. 5 pagina's 4 p. |
Jaar: |
2009 |
Inhoud: |
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Uitgever: |
Elsevier B.V. |
Bronbestand: |
Elektronische Wetenschappelijke Tijdschriften |
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