|
| << previous | next >> |
Journal description
All volumes of the corresponding journal
All issues of the corresponding volume
All articles of the corresponding issues
Details for article 78 of 85 found articles
| Title: |
Surface amorphization, sputter rate, and intrinsic stresses of silicon during low energy Ga+ focused-ion beam milling |
| Author: |
Pastewka, Lars Salzer, Roland Graff, Andreas Altmann, Frank Moseler, Michael |
| Appeared in: |
Nuclear instruments and methods in physics research. Section B, Beam interactions with materials and atoms |
| Paging: | Volume 267 (2009) nr. 18 pages 4 p. |
| Year: |
2009 |
| Contents: | |
| Publisher: |
Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 78 of 85 found articles
| << previous | next >> |