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Sputtering by highly charged ions: Application of the XY–TOF technique to secondary ion ejection from LiF |
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Titel: |
Sputtering by highly charged ions: Application of the XY–TOF technique to secondary ion ejection from LiF |
Auteur: |
Lenoir, J. Boduch, P. Rothard, H. Ban-d’Etat, B. Been, T. Cassimi, A. Jalowy, T. Lebius, H. Manil, B. Ramillon, J.M. |
Verschenen in: |
Nuclear instruments and methods in physics research. Section B, Beam interactions with materials and atoms |
Paginering: |
Jaargang 258 (2007) nr. 1 pagina's 5 p. |
Jaar: |
2007 |
Inhoud: |
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Uitgever: |
Elsevier B.V. |
Bronbestand: |
Elektronische Wetenschappelijke Tijdschriften |
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