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Nanofabrication on a Si surface by slow highly charged ion impact |
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Titel: |
Nanofabrication on a Si surface by slow highly charged ion impact |
Auteur: |
Tona, Masahide Watanabe, Hirofumi Takahashi, Satoshi Nakamura, Nobuyuki Yoshiyasu, Nobuo Sakurai, Makoto Terui, Toshifumi Mashiko, Shinro Yamada, Chikashi Ohtani, Shunsuke |
Verschenen in: |
Nuclear instruments and methods in physics research. Section B, Beam interactions with materials and atoms |
Paginering: |
Jaargang 256 (2007) nr. 1 pagina's 4 p. |
Jaar: |
2007 |
Inhoud: |
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Uitgever: |
Elsevier B.V. |
Bronbestand: |
Elektronische Wetenschappelijke Tijdschriften |
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