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Formation of silver nanoparticles aligned near the bottom of SiO2 film on silicon substrate by negative-ion implantation and post-annealing |
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Titel: |
Formation of silver nanoparticles aligned near the bottom of SiO2 film on silicon substrate by negative-ion implantation and post-annealing |
Auteur: |
Arai, N. Tsuji, H. Ueno, K. Matsumoto, T. Gotoh, N. Aadachi, K. Kotaki, H. Gotoh, Y. Ishikawa, J. |
Verschenen in: |
Nuclear instruments and methods in physics research. Section B, Beam interactions with materials and atoms |
Paginering: |
Jaargang 242 (2006) nr. 1-2 pagina's 4 p. |
Jaar: |
2006 |
Inhoud: |
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Uitgever: |
Elsevier B.V. |
Bronbestand: |
Elektronische Wetenschappelijke Tijdschriften |
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