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                                       Details for article 165 of 194 found articles
 
 
  Solid phase epitaxial regrowth of amorphous layers in silicon created by low energy phosphorus implantation: A medium energy ion scattering study
 
 
Title: Solid phase epitaxial regrowth of amorphous layers in silicon created by low energy phosphorus implantation: A medium energy ion scattering study
Author: Ruffell, S.
Mitchell, I.V.
Simpson, P.J.
Appeared in: Nuclear instruments and methods in physics research. Section B, Beam interactions with materials and atoms
Paging: Volume 242 (2006) nr. 1-2 pages 4 p.
Year: 2006
Contents:
Publisher: Published by Elsevier B.V.
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 165 of 194 found articles
 
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 Koninklijke Bibliotheek - National Library of the Netherlands