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                                       Details for article 13 of 194 found articles
 
 
  Argon ion beam voltages influence the microstructure of aluminum nitride films in a dual ion beam sputtering system
 
 
Title: Argon ion beam voltages influence the microstructure of aluminum nitride films in a dual ion beam sputtering system
Author: Chen, Hong-Ying
Han, Sheng
Shih, Han C.
Appeared in: Nuclear instruments and methods in physics research. Section B, Beam interactions with materials and atoms
Paging: Volume 242 (2006) nr. 1-2 pages 3 p.
Year: 2006
Contents:
Publisher: Elsevier B.V.
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 13 of 194 found articles
 
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 Koninklijke Bibliotheek - National Library of the Netherlands