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Journal description
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Details for article 11 of 194 found articles
| Title: |
Application of highly charged Ar ion beams to ion beam lithography |
| Author: |
Momota, S. Nojiri, Y. Hamagawa, Y. Hamaguchi, K. Taniguchi, J. Ohno, H. |
| Appeared in: |
Nuclear instruments and methods in physics research. Section B, Beam interactions with materials and atoms |
| Paging: | Volume 242 (2006) nr. 1-2 pages 3 p. |
| Year: |
2006 |
| Contents: | |
| Publisher: |
Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 11 of 194 found articles
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