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                                       Details for article 159 of 213 found articles
 
 
  Rate enhancement during thermal oxidation of Ge+-implanted silicon
 
 
Title: Rate enhancement during thermal oxidation of Ge+-implanted silicon
Author: Hossain, K.
Savage, L.K.
Holland, O.W.
Appeared in: Nuclear instruments and methods in physics research. Section B, Beam interactions with materials and atoms
Paging: Volume 241 (2005) nr. 1-4 pages 6 p.
Year: 2005
Contents:
Publisher: Published by Elsevier B.V.
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 159 of 213 found articles
 
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 Koninklijke Bibliotheek - National Library of the Netherlands