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Journal description
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Details for article 22 of 70 found articles
| Title: |
Dose-rate and temperature dependent statistical damage accumulation model for ion implantation into silicon |
| Author: |
Hernández-Mangas, J.M. Arias, J. Marqués, L.A. Ruiz-Bueno, A. Bailón, L. |
| Appeared in: |
Nuclear instruments and methods in physics research. Section B, Beam interactions with materials and atoms |
| Paging: | Volume 228 (2005) nr. 1-4 pages 5 p. |
| Year: |
2005 |
| Contents: | |
| Publisher: |
Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 22 of 70 found articles
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