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Diffusion of ion beam injected self-interstitial defects in silicon layers grown by molecular beam epitaxy |
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Titel: |
Diffusion of ion beam injected self-interstitial defects in silicon layers grown by molecular beam epitaxy |
Auteur: |
De Salvador, D. Napolitani, E. Mirabella, S. Impellizzeri, G. Priolo, F. Terrasi, A. Bisognin, G. Berti, M. Drigo, A.V. Carnera, A. |
Verschenen in: |
Nuclear instruments and methods in physics research. Section B, Beam interactions with materials and atoms |
Paginering: |
Jaargang 216 (2004) nr. C pagina's 5 p. |
Jaar: |
2004 |
Inhoud: |
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Uitgever: |
Elsevier B.V. |
Bronbestand: |
Elektronische Wetenschappelijke Tijdschriften |
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