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Relaxation of ion implant damage in silicon wafers at room temperature measured by thermal waves and double implant sheet resistance |
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Titel: |
Relaxation of ion implant damage in silicon wafers at room temperature measured by thermal waves and double implant sheet resistance |
Auteur: |
Schuur, John Waters, Craig Maneval, Jim Tripsis, Nick Rosencwaig, Allan Taylor, Michael Smith, W.Lee Golding, Lawrence Opsal, Jon |
Verschenen in: |
Nuclear instruments and methods in physics research. Section B, Beam interactions with materials and atoms |
Paginering: |
Jaargang 21 (1987) nr. 1-4 pagina's 5 p. |
Jaar: |
1987 |
Inhoud: |
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Uitgever: |
Published by Elsevier B.V. |
Bronbestand: |
Elektronische Wetenschappelijke Tijdschriften |
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