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Journal description
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Details for article 81 of 242 found articles
| Title: |
Etching characteristics of SiO2 irradiated with focused ion beam |
| Author: |
Sadoh, T. Eguchi, H. Kenjo, A. Miyao, M. |
| Appeared in: |
Nuclear instruments and methods in physics research. Section B, Beam interactions with materials and atoms |
| Paging: | Volume 206 (2003) nr. C pages 4 p. |
| Year: |
2003 |
| Contents: | |
| Publisher: |
Elsevier Science B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 81 of 242 found articles
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