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Journal description
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Details for article 39 of 242 found articles
| Title: |
Computer simulation of plasma for plasma immersed ion implantation and deposition with bipolar pulses |
| Author: |
Miyagawa, Y. Ikeyama, M. Miyagawa, S. Nakadate, H. |
| Appeared in: |
Nuclear instruments and methods in physics research. Section B, Beam interactions with materials and atoms |
| Paging: | Volume 206 (2003) nr. C pages 5 p. |
| Year: |
2003 |
| Contents: | |
| Publisher: |
Elsevier Science B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 39 of 242 found articles
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