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Sequential implantation of halogen and copper ions in silica glass |
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Title: |
Sequential implantation of halogen and copper ions in silica glass |
Author: |
Fukumi, K. Chayahara, A. Kageyama, H. Kinomura, A. Mokuno, Y. Kitamura, N. Kadono, K. Horino, Y. Nishii, J. |
Appeared in: |
Nuclear instruments and methods in physics research. Section B, Beam interactions with materials and atoms |
Paging: |
Volume 206 (2003) nr. C pages 4 p. |
Year: |
2003 |
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Publisher: |
Elsevier Science B.V. |
Source file: |
Elektronische Wetenschappelijke Tijdschriften |
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