|
Measurement of minute local strain in semiconductor materials and electronic devices by using a highly parallel X-ray microbeam |
|
|
|
Title: |
Measurement of minute local strain in semiconductor materials and electronic devices by using a highly parallel X-ray microbeam |
Author: |
Matsui, J. Tsusaka, Y. Yokoyama, K. Takeda, S. Katou, M. Kurihara, H. Watanabe, K. Kagoshima, Y. Kimura, S. |
Appeared in: |
Nuclear instruments and methods in physics research. Section B, Beam interactions with materials and atoms |
Paging: |
Volume 199 (2003) nr. C pages 4 p. |
Year: |
2003 |
Contents: |
|
Publisher: |
Elsevier Science B.V. |
Source file: |
Elektronische Wetenschappelijke Tijdschriften |
|
|
|
|