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Journal description
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Details for article 28 of 115 found articles
| Title: |
Electromigration in integrated circuit interconnects studied by X-ray microscopy |
| Author: |
Schneider, G. Denbeaux, G. Anderson, E. Bates, W. Salmassi, F. Nachimuthu, P. Pearson, A. Richardson, D. Hambach, D. Hoffmann, N. Hasse, W. Hoffmann, K. |
| Appeared in: |
Nuclear instruments and methods in physics research. Section B, Beam interactions with materials and atoms |
| Paging: | Volume 199 (2003) nr. C pages 6 p. |
| Year: |
2003 |
| Contents: | |
| Publisher: |
Elsevier Science B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 28 of 115 found articles
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