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Journal description
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Details for article 159 of 183 found articles
| Title: |
Sub-micron channeling contrast microscopy on reactive ion etched deep Si microstructures |
| Author: |
Teo, E.J. Alkaisi, M Bettiol, A.A. Osipowicz, T. Van Kan, J. Watt, F. Markwitz, A. |
| Appeared in: |
Nuclear instruments and methods in physics research. Section B, Beam interactions with materials and atoms |
| Paging: | Volume 190 (2002) nr. 1-4 pages 6 p. |
| Year: |
2002 |
| Contents: | |
| Publisher: |
Elsevier Science B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 159 of 183 found articles
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