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Compositional and morphological study of reactive ion beam deposited AlN thin films |
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Title: |
Compositional and morphological study of reactive ion beam deposited AlN thin films |
Author: |
Cheng, L.L Yu, Y.H Sundaravel, B Luo, E.Z Lin, S Lei, Y.M Ren, C.X Cheung, W.Y Wong, S.P Xu, J.B Wilson, I.H |
Appeared in: |
Nuclear instruments and methods in physics research. Section B, Beam interactions with materials and atoms |
Paging: |
Volume 169 (2000) nr. 1-4 pages 4 p. |
Year: |
2000 |
Contents: |
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Publisher: |
Elsevier Science B.V. |
Source file: |
Elektronische Wetenschappelijke Tijdschriften |
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