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Journal description
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Details for article 1 of 9 found articles
| Title: |
Effect of MeV O2+ implantation on the reactive ion etch rate of LiTaO3 |
| Author: |
Leech, Patrick W Ridgway, Mark C |
| Appeared in: |
Nuclear instruments and methods in physics research. Section B, Beam interactions with materials and atoms |
| Paging: | Volume 159 (1999) nr. 3 pages 4 p. |
| Year: |
1999 |
| Contents: | |
| Publisher: |
Elsevier Science B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 1 of 9 found articles
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