Evaluation of HfAlO high-k materials for control dielectric applications in non-volatile memories
Titel:
Evaluation of HfAlO high-k materials for control dielectric applications in non-volatile memories
Auteur:
Molas, G. Bocquet, M. Buckley, J. Grampeix, H. Gély, M. Colonna, J.P. Martin, F. Brianceau, P. Vidal, V. Bongiorno, C. Lombardo, S. Pananakakis, G. Ghibaudo, G. De Salvo, B. Deleonibus, S.