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                                       Details for article 53 of 121 found articles
 
 
  High aspect ratio, 0.1 μm structures obtained by single layer resist and conventional electron beam lithography
 
 
Title: High aspect ratio, 0.1 μm structures obtained by single layer resist and conventional electron beam lithography
Author: Gentili, M.
Grella, L.
Luciani, L.
Mastrogiacomo, L.
Scopa, L.
Appeared in: Microelectronic engineering
Paging: Volume 13 (1991) nr. 1-4 pages 4 p.
Year: 1991
Contents:
Publisher: Published by Elsevier B.V.
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 53 of 121 found articles
 
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 Koninklijke Bibliotheek - National Library of the Netherlands