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                                       Details for article 39 of 138 found articles
 
 
  Effect of organic acids on copper chemical mechanical polishing
 
 
Title: Effect of organic acids on copper chemical mechanical polishing
Author: Wu, Yung-Fu
Tsai, Tzu-Hsuan
Appeared in: Microelectronic engineering
Paging: Volume 84 (2007) nr. 12 pages 9 p.
Year: 2007
Contents:
Publisher: Elsevier B.V.
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 39 of 138 found articles
 
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 Koninklijke Bibliotheek - National Library of the Netherlands